发明名称 |
Cleaning liquid and cleaning method |
摘要 |
<p>A cleaning liquid is provided, which comprises an aqueous solution containing nitric acid, sulfuric acid, a fluorine compound, and a basic compound. The concentration of water in the cleaning liquid is 80% by weight or more, and the pH value of the cleaning liquid is from 1 to less than 3. The cleaning liquid is effective for removing etching residues formed in a dry etching process from semiconductor devices and display devices without oxidizing and corroding their metal wirings, particularly, copper wirings and the materials of insulating films.</p> |
申请公布号 |
EP1628336(A2) |
申请公布日期 |
2006.02.22 |
申请号 |
EP20050107342 |
申请日期 |
2005.08.10 |
申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC. |
发明人 |
SHIMADA, KENJI;ABE, KOJIRO;OHTO, MASARU;MATSUNAGA, HIROSHI |
分类号 |
H01L21/311;H01L21/3213 |
主分类号 |
H01L21/311 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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