THE METHOD FOR REMOVING THE RESIDUE IN SEMICONDUCTOR FILM-DEPOSITION PROCESS,申请号KR20040064936-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	THE METHOD FOR REMOVING THE RESIDUE IN SEMICONDUCTOR FILM-DEPOSITION PROCESS
摘要
申请公布号	KR20060016476(A)	申请公布日期	2006.02.22
申请号	KR20040064936	申请日期	2004.08.18
申请人	DONGBUANAM SEMICONDUCTOR INC.	发明人	JOENG, SEI GWANG
分类号	H01L21/205	主分类号	H01L21/205
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Gaming device having multiple award profiles

Aqueous, colloidal gas black suspension

Multi-projection display and projector

Semiconductor device and method of manufacturing the same

Keep vein open method and injector with keep vein open function

Isotropic glass-like conformal coatings and methods for applying same to non-planar substrate surfaces at microscopic levels

Dry etching process for compound semiconductors

Glass substrate for information recording media and information recording medium

Printed circuit board having axially parallel via holes

Method for the production of 1,4- butanediol

N-acetylcysteine compositions and methods for the treatment and prevention of endothelial dysfunction

Fungicidal mixtures based on benzamidoxime derivative and a strobilurin derivative

Transdermal penetration system and treatment for cellulite

Poly(arylene ether) composition

Methods and compositions using thalidomide for the treatment and management of central nervous system disorders or diseases

Thermosetting resin compositions and film articles

Confectionary products including agent for controlling weight

Fiber optical illumination system

Demultiplexer and demultiplexing methods for digital broadcasting receiver

Systems and methods for connecting regions image data having similar characteristics