| 摘要 |
Provided are a method and apparatus for inspecting a defect on a plane, such as a surface or a section, of an object to be inspected. The object is, for instance, a silicon wafer. A whole area of a plane of the object is first imaged by an optical system to gain image signals. Then, a particular region on the plane is positionally detected from the image signals. The particular region includes a blot and a defect and has a higher luminance than a remaining region on the plane. A blot is distinguishably detected from the particular region. A specified region on the plane is then subjected to a detailed inspection under a microscope. The region is set to avoid the blot even if the blot is on the region. The detailed inspection under the microscope is performed toward only the region with no blot.
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