发明名称 |
Particle measurement configuration and semiconductor wafer processing device with such a configuration |
摘要 |
A particle measurement configuration measures the particle concentration in a liquid or gaseous medium by way of a particle measuring instrument. In order to avoid erroneous measurements or damage to the particle measuring instrument, a measuring cell is provided which measures temperature or pressure or pH of the medium. A system controller shuts off a valve if threshold values are exceeded and it prevents the particle measuring instrument from being operated outside a predefined specification.
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申请公布号 |
US7000454(B2) |
申请公布日期 |
2006.02.21 |
申请号 |
US20020233878 |
申请日期 |
2002.09.03 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. |
发明人 |
SCHNEIDER CLAUS;TRUNK RALPH;PFITZNER LOTHAR;SCHMID HEINZ |
分类号 |
G01N19/00;B08B3/08;G01N15/06;G01N15/10 |
主分类号 |
G01N19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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