发明名称 Particle measurement configuration and semiconductor wafer processing device with such a configuration
摘要 A particle measurement configuration measures the particle concentration in a liquid or gaseous medium by way of a particle measuring instrument. In order to avoid erroneous measurements or damage to the particle measuring instrument, a measuring cell is provided which measures temperature or pressure or pH of the medium. A system controller shuts off a valve if threshold values are exceeded and it prevents the particle measuring instrument from being operated outside a predefined specification.
申请公布号 US7000454(B2) 申请公布日期 2006.02.21
申请号 US20020233878 申请日期 2002.09.03
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. 发明人 SCHNEIDER CLAUS;TRUNK RALPH;PFITZNER LOTHAR;SCHMID HEINZ
分类号 G01N19/00;B08B3/08;G01N15/06;G01N15/10 主分类号 G01N19/00
代理机构 代理人
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