| 发明名称 |
Floating gate nitridation |
| 摘要 |
The floating gate, or the oxide between the floating and control gates, or both are nitrided before the control gate layer is deposited.
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| 申请公布号 |
US7001810(B2) |
申请公布日期 |
2006.02.21 |
| 申请号 |
US20040769025 |
申请日期 |
2004.01.30 |
| 申请人 |
PROMOS TECHNOLOGIES INC. |
发明人 |
DONG ZHONG;JANG CHUCK;CHEN CHING-HWA |
| 分类号 |
H01L21/336;H01L21/26;H01L21/28 |
主分类号 |
H01L21/336 |
| 代理机构 |
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