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发明名称
溅镀靶材
摘要
本发明系提供一种溅镀靶材,从而其可在溅镀时尽量不发生放电(arcing)现象、喷溅(splash)现象。本发明系对于溅镀靶材之使用于溅镀之部分进行摩擦搅拌处理者,因此即使是含碳之铝类合金之溅镀靶材、大型溅镀靶材,也可成为确实抑制溅镀时之放电现象、喷溅现象者。
申请公布号
TW200606270
申请公布日期
2006.02.16
申请号
TW094123117
申请日期
2005.07.08
申请人
三井金属业股份有限公司;轻金属股份有限公司
发明人
加藤和照;久保田高史;木村浩;松浦宜范;松崎健嗣
分类号
C23C14/34;C22C21/00
主分类号
C23C14/34
代理机构
代理人
洪武雄;陈昭诚
主权项
地址
日本
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