| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive type resist composition in which a defect, a scum and an elution ratio when liquid immersion exposure are improved and favorable for a liquid immersion exposure, and to provide a pattern forming method using the same. <P>SOLUTION: The positive type resist composition for use in liquid immersion exposure includes (A) a resin which has a monocyclic or polycyclic alicyclic hydrocarbon structure and in which solubility for an alkali developer increases by an action of acid, (B) a compound which generates acid upon irradiation with an active light or a radiation, (C) an alkali soluble compound which has an alkyl group of 5 or more carbon atoms and (D) a solvent. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
