发明名称 SUBSTRATE-RETAINING DEVICE, PROGRAM FOR CONTROLLING THE SAME, STATIC ELIMINATION METHOD, AND RECORDING MEDIUM THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To prevent electrostatic discharge damage reliably, to reduce the radiation time of soft X rays, to improve safety, and to extend a maintenance cycle in a sputter (substrate-retaining device) 1 having a static elimination means for destaticizing a substrate by radiating soft X rays. <P>SOLUTION: The ON/OFF of a soft X-ray ionizer 13 is switched in linking with the operation of a lift pin 12 for carrying in/out a substrate 100 to and from an exposure stage 11, thus performing the static elimination of the substrate 100 by turning on the soft X-ray ionizer 13 when lifting up the substrate 100 from the exposure stage 11, preventing the electrostatic discharge damage of the substrate 100 following peeling electrification, and turning off the soft X-ray ionizer 13 when no substrates 100 have been carried in or the substrate 100 is sucked and retained by the exposure stage 11. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006049390(A) 申请公布日期 2006.02.16
申请号 JP20040224862 申请日期 2004.07.30
申请人 SHARP CORP 发明人 KITO TSUNANORI;OKAMOTO HIROSHI;TAGUSA YASUNOBU
分类号 H01L21/027;G03F7/20;H01L21/683 主分类号 H01L21/027
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