| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To detect foreign matter with high accuracy even for a mask having an edge portion in a mask pattern such as a stencil mask. <P>SOLUTION: An apparatus for inspecting foreign matter present on the surface of an exposure mask (31) is equipped with a means (33) to measure the displacement of surface height of the exposure mask and a means (36) to compare the displacement of height with a predetermined threshold. If the displacement of height exceeds the predetermined threshold, the apparatus recognizes the presence of foreign matter. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
