| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemical amplification-type positive resist composition suitable for excimer laser lithography by ArF, KrF or the like, having various kinds of good resist properties such as sensitivity and resolution, and especially providing excellent line edge roughness. <P>SOLUTION: The star polymer has at least one repeating unit selected from the group consisting of repeating units having three of more branches bonded to a central nucleus, and represented by formulas (1) to (4) and (9), and 1,000-100,000 weight average molecular weight. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
