| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive material processing apparatus having improved performance in a vertical multi-chamber washing structure. SOLUTION: The photosensitive material processing apparatus is equipped with: a bypass passage 100 which connects processing chambers 95 consecutively connected in the downstream side in the conveying direction of a photosensitive material through a passage 58A, at least two or more chambers being laterally or horizontally arranged, with a processing chamber 93 in the upstream side in the conveying direction of a photosensitive material, and which allows a processing liquid to pass through; and a check valve which is disposed in the bypass passage 100 and which does not prevent a processing liquid in the processing chamber 95 in the downstream side of the conveying direction of the photosensitive material from flowing toward the processing chamber 93 in the upstream side of the conveying direction but prevents a processing liquid in the processing chamber 93 in the upstream side from flowing toward the processing chamber 95 in the downstream side. COPYRIGHT: (C)2006,JPO&NCIPI
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