| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and a device for forming a thin film of chromium dioxide having high safety, wherein chromium dioxide is directly formed from chromium. <P>SOLUTION: The forming device 100 for a chromium dioxide thin film comprises: a pressure resisting vessel 10 which is charged with a solution 16 of pH 1.5 to 4.0; a first electrode 12 made of a metal substrate comprising chromium on the surface which is installed in the pressure resisting vessel 10 and is dipped into the solution 16; a second electrode 14 to form a counter electrode to the first electrode which is installed in the pressure resisting vessel 10 and is dipped into the solution 16; a potential source 26 which is connected with a platinum wire 22 from the first electrode 12 and a platinum wire 24 from the second electrode 14, and controls the electrode potential of the first electrode 12 and the second electrode 14 to -4.0 to -2.0 V; and a warming apparatus (not shown in Figure) which warms the solution 16 in the pressure resisting vessel 10. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
