| 摘要 |
The present invention relates to an infrared heating element and a substrate heater type vacuum chamber, particularly for vacuum coating facilities. The infrared heating element comprises a heating source which is surrounded by a protective means designed as a tubular metal jacket. The tubular metal jacket is provided at least to an extent with an infrared-emitting layer. The vacuum chamber comprises a substrate and at least one heating element that is designed as an infrared heating element, the substrate and infrared heating element being thermally decoupled in such a way that only thermal radiation contributes toward heating.
|
