发明名称 ANTIREFLECTION FILM AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide an antireflection film provided with all of satisfactory antiglare property, antireflection property, scratch resistance and high productivity, and to provide a manufacturing method capable of simply and conveniently manufacturing the antireflection film. <P>SOLUTION: In the antireflection film, a light scattering layer and a low refractive index layer are formed on a transparent substrate, the light scattering layer is constituted so that light transmissive particles of average particle size 0.5 to 5 &mu;m are dispersed into a light transmissive resin, the difference of refractive index between the light transmissive particles and the light transmissive resin is 0.02 to 0.2, the light transmissive particles are included by 3 to 30 mass% in total solid content of the light scattering layer and the low refractive index layer is formed by applying a curable composition comprising a binder that contains crosslinkable or polymerizable functional groups and has a refractive index of 1.30 to 1.55. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006048025(A) 申请公布日期 2006.02.16
申请号 JP20050195311 申请日期 2005.07.04
申请人 FUJI PHOTO FILM CO LTD 发明人 YONEYAMA HIROYUKI;NAKAMURA KAZUHIRO
分类号 G02B1/11;B32B7/02;B32B27/30;G02F1/1335 主分类号 G02B1/11
代理机构 代理人
主权项
地址