发明名称 PHOTOSENSITIVE RESIN LAMINATE FOR SANDBLASTING
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin laminate which excels in sensitivity, resolution and adhesion and makes it possible to form fine patterns on a substrate to be processed in a good yield as a mask material for sandblasting, and to provide a surface sandblasting method using the same. <P>SOLUTION: Surface sandblasting is carried out using the photosensitive resin laminate for sandblasting obtained by sequentially stacking a support (A), an alkali-developable photosensitive resin layer (B) and a non-photosensitive alkali-proof resin layer (C). <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006047658(A) 申请公布日期 2006.02.16
申请号 JP20040228197 申请日期 2004.08.04
申请人 ASAHI KASEI ELECTRONICS CO LTD 发明人 TOMITA HIROO;YOSHIDA TOMOKO
分类号 G03F7/027;B32B27/00;G03F7/004;G03F7/11;G03F7/40 主分类号 G03F7/027
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