| 发明名称 |
SHOWER HEAD OF CHEMICAL VAPOR DEPOSITION APPARATUS |
| 摘要 |
<p>There is provided a shower head capable of spraying a process reaction gas onto the surface of a semiconductor wafer to deposit the process reaction gas on the surface of the semiconductor wafer as a thin film of uniform thickness.</p> |
| 申请公布号 |
WO2006016764(A1) |
申请公布日期 |
2006.02.16 |
| 申请号 |
WO2005KR02581 |
申请日期 |
2005.08.09 |
| 申请人 |
UM, PYUNG-YONG;EUGENE TECHNOLOGY CO., LTD. |
发明人 |
UM, PYUNG-YONG |
| 分类号 |
(IPC1-7):H01L21/205 |
主分类号 |
(IPC1-7):H01L21/205 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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