发明名称 SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREFOR
摘要 <P>PROBLEM TO BE SOLVED: To control enlargement of an SRAM cell formation area, and stabilize its operation. <P>SOLUTION: On the gate electrode 33 of an SRAM cell's access transistor Q5, a contact 45 is formed that is connected to a word line. The contact 45 penetrates through an element separating insulation film 14 into an SOI layer 13. A driver transistor Q1's body region and a first access transistor Q5's body region are electrically connected with each other via the SOI layer 13 lying below the element separating insulation film 14. Accordingly, the access transistor Q5 is formed into a DTMOS structure where its gate electrode and body region are connected by the contact 45, which is further electrically connected to the body region of the first driver transistor Q1. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006049784(A) 申请公布日期 2006.02.16
申请号 JP20040248166 申请日期 2004.08.27
申请人 RENESAS TECHNOLOGY CORP 发明人 HIRANO YUICHI;IPPOSHI TAKASHI;MAEKAWA SHIGETO;ARAI KOJI
分类号 H01L27/11;H01L21/8244 主分类号 H01L27/11
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