发明名称 |
Method of manufacturing polishing slurry for use in precise polishing process |
摘要 |
An abrasive and a dispersion medium are introduced into a dispersing machine to uniformly disperse the abrasive. The liquid to be processed after dispersion is centrifugally classified by a centrifugal classifier to remove heavy particles which will cause scratches. Chemicals are added to the liquid to be processed after classification to make adjustments on a variety of properties such as the concentration, pH, and the like. The polishing slurry after adjustment for a desired composition is filtered by a filter to remove debris therefrom. The filter may have a mesh size large enough to allow particles of the abrasive to pass therethrough.
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申请公布号 |
US2006032148(A1) |
申请公布日期 |
2006.02.16 |
申请号 |
US20050192364 |
申请日期 |
2005.07.29 |
申请人 |
TOKYO MAGNETIC PRINTING CO., LTD |
发明人 |
KUNUGI TAKAHARU;KAKU TOMOHIRO;SASAKURA TAKANORI |
分类号 |
C09K3/14;B24B37/00;B24B57/02;B24D3/02;C09C1/68;H01L21/304 |
主分类号 |
C09K3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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