METHOD AND MARK FOR METROLOGY OF PHASE ERRORS ON PHASE SHIFT MASKS

摘要

A method of inspecting a phase shift mask is disclosed. The method includes receiving a mask having an alternating phase shift pattern. The method also includes forming the alternating phase shift pattern on a wafer (102). The method further includes analyzing the alternating phase shift pattern on the wafer (104) to determine the phase difference of the alternating phase shift pattern (106).