发明名称 Electron microscope array for inspection and lithography
摘要 A system and method for rapidly processing a specimen. The method includes generating a plurality of charged-particle beams travelling substantially along respective axes of an array of charged-particle beam columns by providing each beam column with two permanent magnets having at least one magnetic dipole disposed in a plane perpendicular to the axis. The trajectory of the beams is independently controlled and the beam is focussed onto the specimen using additional correctional coils. The beams are deflected while maintaining incidence of the beam on the specimen parallel to the axis. Preferably, the charged particle beams include non-crossover charged particle beams. Preferably, the method further includes detecting charged particles scattered from the specimen using a detector at least partially immersed in a magnetic field, by utilizing at least in part the magnetic field.
申请公布号 US2006033035(A1) 申请公布日期 2006.02.16
申请号 US20050203299 申请日期 2005.08.15
申请人 ITZKOVITCH MORDECHAI;KOLARIK VLADIMIR;GOLAN GILAD;KARIN JACOB 发明人 ITZKOVITCH MORDECHAI;KOLARIK VLADIMIR;GOLAN GILAD;KARIN JACOB
分类号 H01J1/50 主分类号 H01J1/50
代理机构 代理人
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