发明名称 POLISHING AND BUFFING PAD
摘要 A buffing and polishing pad or other structure uses extremely fine microfibers of less than 1 denier. Preferred fibers are less than 0.7 denier, and in some cases considerably less. The currently most preferred embodiment is 50% fiber having 0.5 denier and 50% fiber having 0.3 denier. Preferred fibers have an average fiber length of between about 70 and about 90 mm, and most preferably about 80 mm. The fibers can be any suitable material, natural or synthetic, including especially polyester. The fibers are preferably made on a circular knitting machine.
申请公布号 WO2005035187(A3) 申请公布日期 2006.02.16
申请号 WO2004US27545 申请日期 2004.08.24
申请人 MEGUIAR'S, INC.;SILVERS, GARY M.;SEVIGNY, CLAUDE;BERGMAN, ROBERT 发明人 SILVERS, GARY M.;SEVIGNY, CLAUDE;BERGMAN, ROBERT
分类号 A47L11/164;A47L13/16;A47L13/28;B24D13/14 主分类号 A47L11/164
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