| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a halftone mask by which no misalignment between a light shielding film and a halftone film is caused in a halftone mask having a light shielding film. <P>SOLUTION: The method includes: halftone film forming steps (S102 to S110) to selectively form a halftone film which shifts a phase of exposure light on a transparent substrate; a photosensitive material film forming step (S122) to form a photosensitive material film on the transparent substrate, the photosensitive material film which does not transmit the exposure light; an exposing step (S124) to expose the photosensitive material film by using the halftone film as a mask for pattern formation; and a developing step (S126) to develop the exposed photosensitive material film. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
