| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask in which chromium chloride being a reaction product by dry etching and depositing on the surface of the photomask is removed, a quartz substrate is not corroded, and thereby, preferable light transmitting property is obtained, and to provide a method for manufacturing the photomask. <P>SOLUTION: The photomask has a light shielding film 2' as patterned and a photocatalyst-containing film 3' successively layered on one surface of a transparent substrate 1. The photocatalyst-containing film contains titanium dioxide (TiO<SB>2</SB>), zinc oxide (ZnO) or other photocatalysts. The light shielding film 2 contains chromium (Cr) or titanium (Ti). The width of an aperture on one surface of the transparent substrate is ≤400 nm. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
