| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin composition enabling formation of the substrate layer of an ink accepting layer excellent in surface smoothness and a forming method of the substrate layer of the ink accepting layer excellent in the surface smoothness. <P>SOLUTION: The resin composition contains a photopolymerizable oligomer or a photopolymerizable monomer, a white pigment and a surfactant and has a viscosity of 100-2,000 mPa s at 25°C. In the forming method of the substrate layer of the ink accepting layer, the resin composition is applied by a spin coating method to form a coating film and this film is exposed to ultraviolet rays or electron beams to be cured. Thereby the substrate layer of the ink accepting layer is formed. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
