| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To check a coated substrate quickly for presence of uneven coating when the surface of the substrate is coated with coating liquid produced by dissolving a coating film forming component into solvent. <P>SOLUTION: A substrate, e.g. a wafer W, is carried into a housing 3 by means of a carrying arm A and held horizontally on a spin chuck 31 before being coated with coating liquid from a coating liquid nozzle 5. When a coated wafer W is being carried out from the housing 3, image of the surface of the wafer W is acquired by means of a line sensor 72 and presence of uneven coating is judged based on that image data. Consequently, presence of uneven coating on the surface of the wafer W can be detected quickly and detection results can be reflected effectively on wafers W being processed subsequently. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
