发明名称 IMPROVEMENT OF ADHESION OF RESIST
摘要 PROBLEM TO BE SOLVED: To improve the adhesion of a negative resist for improving reliability since there are problems such as resist collapses during the copper electroplating, the deformation of the wiring and the short-circuit between wirings because of that the adhesion between the copper sputtered film and the resist is inferior though the wirings are formed on a wafer fitted with a copper sputtered film by copper electroplating after being engraved with the resist. SOLUTION: In order to improve the adhesion between a copper sputtered film and a negative resist, a wafer after being engraved with a resist is subjected to heat treatment. Thus, the resist does not collapse even if copper electroplating is performed. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006045650(A) 申请公布日期 2006.02.16
申请号 JP20040231823 申请日期 2004.08.09
申请人 NOGE DENKI KOGYO:KK;KANTO GAKUIN UNIV SURFACE ENGINEERING RESEARCH INSTITUTE 发明人 IZAWA KAZUHIKO;KOIWA KENTARO;UMEDA YASUSHI;HONMA HIDEO;OYAMADA JINKO
分类号 C25D5/02;C25D7/12 主分类号 C25D5/02
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