发明名称 |
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM FOR FORMING CARBON NANOTUBES |
摘要 |
<p>An embodiment of a system for forming carbon nanotubes (CNTs) using plasma enhanced chemical vapor deposition (PECVD) uses one or more of RF and DC power supplies coupled to electrodes in various configurations within a process chamber of the system. By application of a sufficient DC voltage to one or more electrodes, the system allows for growing CNTs that can be straighter and have improved electrical performance characteristics.</p> |
申请公布号 |
WO2006017340(A2) |
申请公布日期 |
2006.02.16 |
申请号 |
WO2005US24871 |
申请日期 |
2005.07.12 |
申请人 |
CDREAM CORPORATION;KANG, SUNG GU;BAE, WOO KYUNG |
发明人 |
KANG, SUNG GU;BAE, WOO KYUNG |
分类号 |
C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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