EQUIPMENT FOR PHOTO RESIST,申请号KR20040063749-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	EQUIPMENT FOR PHOTO RESIST
摘要
申请公布号	KR20060014963(A)	申请公布日期	2006.02.16
申请号	KR20040063749	申请日期	2004.08.13
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	RYU, BYUNG CHUL
分类号	H01L21/027	主分类号	H01L21/027
代理机构		代理人
主权项
地址

您可能感兴趣的专利

SINGLE AND DOUBLE-BEAM SPECTROPHOTOMETER

MEASURING CHANGE OF CONDUCTIVITY OF A LIQUID

Rotational displacement measuring instrument

A mixing tap for one hand operation

IMPROVEMENTS IN TELESCOPIC SUPPORT PROPS FOR MINERAL MINING

Worm drive clips

BINDERS FOR FOUNDRY CORES AND MOULDS

THE PREPARATION OF ADDUCTS WHICH MAY BE USED IN THE PREPARATION OF COMPOUND SEMICONDUCTOR MATERIALS

DIELECTRIC CERAMIC COMPOSITION

Access equipment

Improvements in or relating to a marine derrick

Guide mechanism for removing pulverulent or granular material from a supply pipe to one of two discharge pipes

An adjustable mounting assembly for the seat of a vehicle

Method and apparatus for applying liquid sealants to elongated sockets

Rotary index table with fluid pressure preloaded bearings

ELECTROSTATIC IMAGE DEVELOPMENT

Electrode coating process

Improvements in methods of coating surfaces to render them abrasion resistant