发明名称 LITHOGRAPHY EQUIPMENT AND METHOD OF MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a more efficient microlens array system. <P>SOLUTION: A projection system comprises a lens array constituted such that it receives a beam to which pattern forming was carried out, divides the beam to which pattern forming has been carried out into a plurality of nearly polygonal portions, focuses the nearly polygonal portions respectively, and forms radiation spots on the target portion of a substrate. In one embodiment, an illumination system comprises an illumination unit, constituted such that it receives a radiation beam from a radiation source. The illumination unit comprises lens array constituted such that it divides the radiation beam from the radiation source into a plurality of nearly polygonal portions and focuses the nearly polygonal portions on the elements of the array of the elements which can be controlled individually. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006049898(A) 申请公布日期 2006.02.16
申请号 JP20050220018 申请日期 2005.07.29
申请人 ASML NETHERLANDS BV 发明人 GUI CHENG-QUN
分类号 H01L21/027;G02B19/00;G02B26/08;G03F7/20 主分类号 H01L21/027
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