| 摘要 |
<P>PROBLEM TO BE SOLVED: To realize a projection system with reduced complexity, deliverying high performance. <P>SOLUTION: There is provided a projection system used in a lithography tool for processing a modulated light used for forming an image on a substrate, comprising an off-axis mirror segment for receiving the modulated light; an aperture diaphragm for receiving the modulated light from an off-axis mirror segment; and a refractive lens group for focusing the modulated light on the substrate. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
