发明名称 METHOD FOR MANUFACTURING SUBSTRATE WITH RECESSED PART FOR MICROLENS, AND TRANSMISSION-TYPE SCREEN
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate with recessed parts for a microlens which can fully promote isotropic etching by preventing an etching mask film from being removed or broken at the time of wet etching. <P>SOLUTION: The method for manufacturing the substrate(S) with recessed parts for the microlens comprises a step for forming etching mask films(12, 14) on the surface of the substrate(10), a step for forming through-holes(16) by irradiating a laser beam in the region where each recessed part is formed, and at the same time, deteriorating whole etching mask films(12, 14) by heating, and a step for forming recessed parts(20) on the surface of the substrate by bringing an etching liquid into contact with the surface of the substrate(10) exposed by the through-holes(16). <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006044974(A) 申请公布日期 2006.02.16
申请号 JP20040226829 申请日期 2004.08.03
申请人 SEIKO EPSON CORP 发明人 YOSHIMURA KAZUTO;ISHII MAKOTO
分类号 C03C15/00;B23K26/00;B29C39/02;B29L11/00;G02B3/00;G03B21/62 主分类号 C03C15/00
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