发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a technique which improves a productivity of a semiconductor device. <P>SOLUTION: In manufacturing the semiconductor device 1, such a chucking jig 30 is used that has a structure in which the angle of a chucking surface 34b abutting on the semiconductor device 1 varies when a pressure is applied obliquely to the chucking surface 34b, and a chucking pad 34 having the chucking surface 34b is composed of a low resilient material. The angle of the chucking surface 34b varies by an attractive force when the chucking jig 30 is chucked and fixed to the semiconductor device 1, and the chucking pad 34 is formed with a low resilient material which is not deformed by the attractive force when the chucking jig 30 is chucked and fixed to the semiconductor device 1. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006049485(A) 申请公布日期 2006.02.16
申请号 JP20040226732 申请日期 2004.08.03
申请人 RENESAS TECHNOLOGY CORP 发明人 WATABE TOSHIHIRO
分类号 H01L21/677;B65G49/07;H01L21/60 主分类号 H01L21/677
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