| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition which is used in a process of manufacturing a semiconductor such as IC, in manufacture of a circuit board for a liquid crystal, a thermal head or the like, and in another photofabrication process, has small PEB temperature dependency, exhibits a good profile, and ensures little pattern collapse, and to provide a compound for use in the photosensitive composition and a pattern forming method using the photosensitive composition. <P>SOLUTION: The photosensitive composition contains a compound which generates a specific sulfonic acid upon irradiation with an actinic ray or a radiation. The compound generates a specific sulfonic acid upon irradiation with an actinic ray or a radiation. The pattern forming method uses the photosensitive composition which contains a compound which generates a specific sulfonic acid upon irradiation with an actinic ray or a radiation. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
