| 发明名称 |
Substrate, device, method of manufacturing device, method of manufacturing active-matrix substrate, electro-optical apparatus and electronic apparatus |
| 摘要 |
A substrate on which a pattern is formed by a discharged functional liquid, includes a coating region coated with the functional liquid, and banks formed to enclose the coating region, wherein a difference between a contact angle of the functional liquid with respect to the coating region and a contact angle of the functional liquid with respect to the bank is above 40°.
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| 申请公布号 |
US2006035064(A1) |
申请公布日期 |
2006.02.16 |
| 申请号 |
US20040836205 |
申请日期 |
2004.05.03 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HIRAI TOSHIMITSU |
| 分类号 |
B32B3/00;G02F1/13;B41J2/01;C03C17/34;G02F1/136;G02F1/1368;G09F9/00;G09F9/30;H01L21/00;H01L21/027;H01L21/288;H01L21/3205;H01L21/336;H01L21/768;H01L21/77;H01L27/32;H01L29/49;H01L29/786;H01L51/00;H05B33/10 |
主分类号 |
B32B3/00 |
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