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发明名称
对向靶材式溅镀装置
摘要
本发明提供一种对向靶材式溅镀装置包含:一腔体,其系在一真空环境,且一溅镀气体注入该腔体;一第一靶材单元,包括一第一靶材,其靶材表面系面向腔体之中心,且一第一磁场产生器以相对于第一靶材的靶材表面之方式附在第一靶材;一第二靶材单元,包括一第二靶材,其靶材表面系面向第一靶材之靶材表面,且一第二磁场产生器以相对于第二靶材的靶材表面之方式附在第二靶材,其中第一及第二磁场产生器之对向极具有不同极性;以及第一及第二基板支撑单元,其分别支撑二基板朝向第一及第二靶材单元的两者侧边。
申请公布号
TW200829711
申请公布日期
2008.07.16
申请号
TW096143412
申请日期
2007.11.16
申请人
塔工程有限公司
发明人
李相铉
分类号
C23C14/34(2006.01)
主分类号
C23C14/34(2006.01)
代理机构
代理人
江孟贞
主权项
地址
韩国
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