发明名称 APPARATUS FOR MANUFACTURING GAS IMPERMEABLE LAYER, AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To solve the problem of applying a transparent and gastight coating by means of a sputtering arrangement onto a substrate of a synthetic material, and to produce a reflecting barrier layer with the same sputtering arrangement. SOLUTION: An arrangement and a method are for the production of gas-impermeable layers, in particular for the production of the coating of gas-permeable synthetic material substrates. With the aid of this arrangement or of the method, light-permeable as well as also light-impermeable gas-blocking layers are produced using only one sputtering installation. A simple change-over switching from one gas supply, for example argon, to a second gas supply, for example argon, oxygen and nitrogen is carried out or the converse also can be done. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006045658(A) 申请公布日期 2006.02.16
申请号 JP20040327289 申请日期 2004.11.11
申请人 APPLIED FILMS GMBH & CO KG 发明人 HEGEMANN THOMAS;SOMMER ELISABETH
分类号 C23C14/06;B32B9/00;C23C14/20;C23C14/34 主分类号 C23C14/06
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