METHOD OF FORMING TRANSPARENT CONDUCTIVE FILM AND TRANSPARENT CONDUCTIVE FILM

摘要

PROBLEM TO BE SOLVED: To provide a method of forming a transparent conductive film which enables a transparent conductive film having a low resistance and a high visible light transmittance to be formed by irradiating a coating film with plasma in the atmosphere without requiring heat treatment or an evacuated atmosphere and is advantageous in mass productivity and cost because of the use of a coating method, and to provide the transparent conductive film. SOLUTION: The method of forming a transparent conductive film is characterized in that a coating film 7 is formed by coating a substrate 6 with conductive paint, and reaction gas is introduced onto the coating film 7 under an atmospheric pressure to make the reaction gas into plasma P, and the coating film 7 is irradiated with the plasma P to be modified, whereby a transparent conductive film 9 is formed on the substrate 6. COPYRIGHT: (C)2006,JPO&NCIPI