| 摘要 |
PROBLEM TO BE SOLVED: To form a fuse stably cutting cobalt and tungsten of high melting point metals at the time of performing silicide formation by using the high melting point metal for the resistance reduction of a trimming fuse. SOLUTION: In the trimming fuse formed with the polycrystalline silicon provided on a semiconductor substrate, while forming a fuse with salicide of the high melting point metal such as cobalt and tungsten, it is made easy to cut at a cut section 2 with polycrystalline silicon with a low melting point. COPYRIGHT: (C)2006,JPO&NCIPI
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