OPTICAL CHARACTERISTIC MEASURING DEVICE, OPTICAL CHARACTERISTIC MEASURING METHOD, EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

An optical characteristic measuring device (90) includes an opening (97) for passing illumination light, a micro lens array (98) for measuring a wavefront aberration, and an optical system unit (93) for selectively arranging polarized light detection system (99) for measuring the polarization state of the illumination light, on an optical path of the illumination light. Accordingly, the optical characteristic measuring device (90) can simultaneously measure the illumination shape and size of the illumination optical system, the wavefront aberration of the projection optical system, and polarization state of the illumination light. For example, even when performing exposure by the polarized illumination which is a type of modified illumination, it is possible to realize a highly-accurate exposure by adjusting the various optical systems according to the measurement result.