| 摘要 |
A light-transmitting substrate with a transparent electroconductive film, which comprises a light-transmitting substrate and, formed thereon, a continuous transparent electroconductive film having a film thickness of 2 to 12 nm, wherein, preferably, the transparent electroconductive film is an aggregate of columner single crystals, the transparent electroconductive film has a maximum surface roughness in the range of 1 to 20 nm and an average surface roughness in the range of 0.1 to 10 nm, the transparent electroconductive film is a thin film of tin-doped indium oxide, tin atoms are uniformly distributed in the thin film of tin-doped indium oxide, the light-transmitting substrate with a transparent electroconductive film exhibits a transmittance for a light having a wave length of 400 nm of 88% or more, a transmittance for a light having a wave length of 350 nm of 85% or more, and a transmittance for all lights of 90% or more. The light-transmitting substrate with a transparent electroconductive film exhibits satisfactorily high transparency. |
