| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and method for inspecting irregularities in a periodic pattern, capable of stably and precisely detecting the irregularities of the periodic pattern. SOLUTION: The apparatus for inspecting the irregularities of the periodic pattern is equipped with an imaging section (10), having at least a means for imaging an image; an XY stage (20), on which an object substrate to be inspected is mounted and which has a means for driving it in the X-axis and Y-axis directions; an illumination section (30) having a means for illuminating the object substrate to be inspected; an optical filter changing section (40a, 40b) which sets optical filters at the illumination section and/or the photographing section, in order to regulate their optical characteristics and which has a means of enabling the optical filters to be changed; and a section (60) for controlling the apparatus. COPYRIGHT: (C)2006,JPO&NCIPI
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