| 摘要 |
A plasma processing apparatus, a radio frequency generator and a correction method thereof are provided to reduce power correction time in correcting output power of a high frequency power supply. A high frequency power supply unit(200) has a power setting value of at least high frequency power, a data input port capable of inputting an offset value to correct output power as digital data and a power output port(202) outputting the high frequency power, and adjusts a target power output value on the ground of the power setting value and the offset value and transmits the high frequency power according to the target power output value from the power output port. A process chamber(300) is supplied with the high frequency power through a transmission path from the high frequency power supply unit, and performs plasma processing for a substrate by plasma. A power value detection unit is intervened between the transmission path and a matching unit(104), and detects the high frequency power value inputted to the matching unit. A power supply control unit(400) obtains the offset value according to the difference value between the power setting value and the power detection value, and transmits the power setting value and the offset value to a data input port of the high frequency power supply unit, and controls high frequency power outputted from the power output port of the high frequency power supply unit.
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