发明名称 Method and arrangement for controlling a glow discharge plasma under atmospheric conditions
摘要 The present invention is directed to a method and arrangement for controlling a glow discharge plasma in a gas or gas mixture under atmospheric conditions, in a plasma discharge space comprising at least two spaced electrodes (2), wherein at least one plasma pulse having an absolute pulse maximum is generated by applying an AC plasma energizing voltage to the electrodes (2) causing a plasma current and a displacement current. The plasma is controlled by providing a relative decrease of the displacement current after the pulse maximum. In a preferred embodiment, the energizing voltage is applied through a series circuit of a choke coil (3) and a non-saturable inductor (4).
申请公布号 EP1626613(A1) 申请公布日期 2006.02.15
申请号 EP20040077286 申请日期 2004.08.13
申请人 FUJI PHOTO FILM B.V. 发明人 DE VRIES, HINDRIK WILLEM;KAMIYAMA, YOICHIRO;BOUWSTRA, JAN BASTIAAN;VAN DE SANDEN, MAURITIUS CORNELIUS MARIA;ALDEA, EUGEN;PEETERS, PAUL
分类号 H05H1/24;H01J37/32 主分类号 H05H1/24
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