| 发明名称 |
METHOD FOR APPLYING A TOPOLOGICAL PATTERN TO AN ARTICLE MADE OF SILICATE MATERIAL |
| 摘要 |
The proposed method for applying a topological pattern to an article made of silicate material consists in cleaning the surface of the article, applying metallic coating in vacuum at the cleaned surface, and producing the topological pattern by removing the coating at the specified areas of the surface by laser radiation.
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| 申请公布号 |
UA12552(U) |
申请公布日期 |
2006.02.15 |
| 申请号 |
UA20050007699 |
申请日期 |
2005.08.02 |
| 申请人 |
LASHKARIOV INSTITUTE OF SEMICONDUCTOR PHYSICS OF THE NATIONAL ACADEMY OF SCIENCES OF UKRAINE |
发明人 |
MASLOV VOLODYMYR PETROVYCH;KOLOMZAROV YUR3I V3KTOROVYCH |
| 分类号 |
H01S3/14;H01S3/22;H05K3/02;H05K3/18;(IPC1-7):H01S/14;H01S/22;H05K/02;H05K/18 |
主分类号 |
H01S3/14 |
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