发明名称 LAYER CONFIGURATION WITH IMPROVED STABILITY TO SUNLIGHT EXPOSURE
摘要 A composition exclusive of hydroquinone comprising at least one polymer comprising (3, 4-dialkoxythiophene) monomer units, in which the two alkoxy groups may be the same or different or together represent an optionally substituted oxy-alkylene-oxy bridge, a polyanion, at least one aromatic compound exclusive of sulfo groups and containing at least two hydroxy groups and at least one polyhydroxy-and/or carboxy group or amide or lactam group containing aliphatic compound and/or at least one aprotic compound with a dielectric constant >= 15; and a layer configuration on a support, said layer configuration comprising a layer exclusive of hydroquinone comprising at least one polymer comprising optionally substituted (3, 4-dialkoxythiophene) monomer units, in which the two alkoxy groups may be the same or different or together represent an optionally substituted oxy-alkylene-oxy bridge, a polyanion, at least one aromatic compound exclusive of sulfo groups and containing at least two hydroxy groups and at least one polyhydroxy-and/or carboxy group or amide or lactam group containing aliphatic compound and/or at least one aprotic compound with a dielectric constant >= 15. ® KIPO & WIPO 2009
申请公布号 KR20090089862(A) 申请公布日期 2009.08.24
申请号 KR20097011597 申请日期 2007.10.31
申请人 AGFA-GEVAERT 发明人 LOUWET FRANK;BOLLENS LOUIS
分类号 C08L65/00;C08K5/13;C08L81/02 主分类号 C08L65/00
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