发明名称 Stage device, exposure system, method of device manufacture, and device
摘要 A barrel supporting bed ( 58 ) for holding a projection optical system (PL), a driving mechanism ( 86 A, 86 B) for driving a stage (WST), a frame ( 84 A, 84 B) in which a reaction force caused by driving the stage (WST) is transmitted in a non-contact to the supporting bed ( 58 ), and a damping member ( 85 ) that is arranged on the frame are provided. Therefore, a vibration and a reaction force, which are caused by the reaction force caused by driving the stage, are damped by the damping member and are transmitted to the earth (set floor), thereby making it possible to effectively reduce a force that is transmitted to the supporting bed from the earth. The frame and the supporting bed have an independent relationship with respect to the vibration, so that the reaction force and the vibration of the frame due thereto exert no direct influence on the projection optical system. This results in suppressing an influence on exposure accuracy which is exerted by vibration of components in an apparatus.
申请公布号 US6999162(B1) 申请公布日期 2006.02.14
申请号 US20010830684 申请日期 2001.04.30
申请人 NIKON CORPORATION 发明人 TAKAHASHI MASATO
分类号 G03B27/62;G03B27/42;G03B27/58;G03F7/20 主分类号 G03B27/62
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