Method For Making Minute Pattern In The Semiconductor Device Manufacture Processing,申请号KR20030100536-传众专利搜索

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发明名称	Method For Making Minute Pattern In The Semiconductor Device Manufacture Processing
摘要
申请公布号	KR100550895(B1)	申请公布日期	2006.02.10
申请号	KR20030100536	申请日期	2003.12.30
申请人		发明人
分类号	H01L21/027;H01L21/44;H01L21/768	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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