发明名称 SOLID STATE IMAGING APPARATUS AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To prevent noise from occurring on imaging data owing to reflection of light on a side end surface of cover glass of a solid state imaging apparatus and on an inner wall surface of a spacer. SOLUTION: The solid state imaging apparatus 2 is configured such that the spacer 5 surrounds the solid state imaging device 3 provided on the semiconductor substrate 4, a portion above which is sealed with a cover glass 6. A first anti reflective coating 20 and a second anti reflective coating 21 both for preventing reflection of light are formed respectively on a side end surface of the cover glass 6 and on an inner wall surface of the spacer 5. Although inclined light like L1, L2 is sometimes incident on the cover glass 6, the first antireflective coating 20 and the second antireflective coating 21 prevent the light from being reflected therefrom, so that it is prevented that reflected light is incident on the solid state imaging device 3 to cause any noise on the imaging data. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006041277(A) 申请公布日期 2006.02.09
申请号 JP20040220687 申请日期 2004.07.28
申请人 FUJI PHOTO FILM CO LTD 发明人 NISHIDA KAZUHIRO;MAEDA HIROSHI;YAMAMOTO KIYOBUMI
分类号 H01L27/14 主分类号 H01L27/14
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