发明名称 SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To restrict the consumption volume of a treatment liquid in a batch processing. SOLUTION: A substrate processing device is provided with a photosensor 200 for detecting whether to contain a substrate in a carrier cassette for each stage, two processing tubs 40a, 40b which perform the same processing simultaneously, and a supply mechanism 30 for supplying the treatment liquid independently to the processing tubs 40a, 40b, respectively. The substrate processing device detects the number N of substrates 90 in response to the detected result of the photosensor 200, and performs a processing to supply the treatment liquid only to the processing tub 40a if the number N is equal to or less than an allowable number of the processing tub 40a. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006041254(A) 申请公布日期 2006.02.09
申请号 JP20040220256 申请日期 2004.07.28
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MASUDA HIROSHI;ARAKI HIROYUKI
分类号 H01L21/304 主分类号 H01L21/304
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