| 摘要 |
The invention relates to a gas mixture, a pressure tank containing the gas mixture, a method that uses the gas mixture during thermal spraying, cutting, joining, deposition welding and/or surface treatment by means of arcs, plasma and/or lasers, a device for preparing the gas mixture and a method for manufacturing the gas mixture, wherein the gas mixture contains a protective gas and a protective gas additive selected from the group of ethers, cyclic amines containing at least one ether group, and mixtures thereof. |
